The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 2008

Filed:

Jun. 05, 2006
Applicants:

Cheng-kuo Lin, Tao Yuan Shien, TW;

Wei-der Chang, Tao Yuan Shien, TW;

Yu-chi Wang, Tao Yuan Shien, TW;

Inventors:

Cheng-Kuo Lin, Tao Yuan Shien, TW;

Wei-Der Chang, Tao Yuan Shien, TW;

Yu-Chi Wang, Tao Yuan Shien, TW;

Assignee:

Win Semiconductors Corp., Tao Yuan Shien, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03F 3/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

A two-port dual-gate field-effect transistor for amplifier applications, wherein a self-bias circuit includes a number of passive elements, such as resistors, diodes and capacitors, is utilized to coupled the output of the amplifier with a second gate of the dual-gate device as a bias source, which transforms the conventional three-port cascade topology into a two-port dual-gate device so as to facilitate device testing, modeling, and packaging for discrete device application. The technology improves the RF performance in conventional two-port single-gate HEMT devices, with slight noise figure degradation.


Find Patent Forward Citations

Lin, Cheng-Kuo. (2008). Two-port dual-gate hemt for discrete device application (U.S. Patent No. 7420417). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7420417

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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