The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2008
Filed:
Sep. 30, 2005
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Carolus Ida Maria Antonius Spee, Helmond, NL;
Derk Jan Wilfred Klunder, Geldrop, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Carolus Ida Maria Antonius Spee, Helmond, NL;
Derk Jan Wilfred Klunder, Geldrop, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an Hcontaining gas in at least part of the apparatus includes producing hydrogen radicals from Hfrom the Hcontaining gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.