The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2008
Filed:
Nov. 17, 2004
Joost Jeroen Ottens, Veldhoven, NL;
Noud Jan Gilissen, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Koen Jacobus Johannes Maria Zaal, Eindoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Noud Jan Gilissen, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Koen Jacobus Johannes Maria Zaal, Eindoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.