The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7410838 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 12, 2008

Filed:

Apr. 29, 2004
Applicant:

Kern-huat Ang, Johor, MY;

Inventor:

Kern-Huat Ang, Johor, MY;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/82 (2006.01);
U.S. Cl.
CPC ...
Abstract

A memory cell and a method of fabricating the same. A first conductive layer on a substrate is provided and a first type doped semiconductor layer is then formed on the first conductive layer. The first type doped semiconductor layer and the first conductive layer are patterned into a first line. A dielectric layer is formed on the substrate with an opening exposing the first line. A column comprising a second diode component, a buffer layer, and an anti-fuse layer is formed in the opening. A second line is formed connecting the column on the dielectric layer running generally perpendicularly to the first line.


Find Patent Forward Citations

Ang, Kern-Huat. (2008). Fabrication methods for memory cells (U.S. Patent No. 7410838). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7410838

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…