The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2008
Filed:
Aug. 19, 2004
Robert D. Harned, Redding, CT (US);
Lev Sakin, Stamford, CT (US);
Patrick DE Jager, Veldhoven, NL;
Cheng-qun Gui, Best, NL;
Irina Pozhinskaya, Stamford, CT (US);
Noreen Harned, Redding, CT (US);
Robert D. Harned, Redding, CT (US);
Lev Sakin, Stamford, CT (US);
Patrick de Jager, Veldhoven, NL;
Cheng-Qun Gui, Best, NL;
Irina Pozhinskaya, Stamford, CT (US);
Noreen Harned, Redding, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The system may be a 2× magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2× optical system can be used to expose FPDs. The designs for the 1.5× and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface.