The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 29, 2008

Filed:

Feb. 22, 2006
Applicants:

Srinivas Vedula, Fremont, CA (US);

Amir Azordegan, Santa Clara, CA (US);

Laurence Hordon, Santa Clara, CA (US);

Alan D. Brodie, Palo Alto, CA (US);

Gian Francesco Lorusso, Leuveen, BE;

Takuji Tada, San Jose, CA (US);

Inventors:

Srinivas Vedula, Fremont, CA (US);

Amir Azordegan, Santa Clara, CA (US);

Laurence Hordon, Santa Clara, CA (US);

Alan D. Brodie, Palo Alto, CA (US);

Gian Francesco Lorusso, Leuveen, BE;

Takuji Tada, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); G21K 7/00 (2006.01); H01J 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

One embodiment relates to an electron beam apparatus for automated imaging of a substrate surface. An electron source is configured to emit electrons, and a gun lens is configured to focus the electrons emitted by the electron source so as to form an electron beam. A condenser lens system is configured to receive the electron beam and to reduce its numerical aperture to an ultra-low numerical aperture. An objective lens is configured to focus the ultra-low numerical aperture beam onto the substrate surface. Other embodiments are also disclosed.


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