The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2008
Filed:
Sep. 19, 2005
Applicants:
William G. En, Milpitas, CA (US);
Thorsten Kammler, Ottendorf-Okrilla, DE;
Eric N. Paton, Morgan Hill, CA (US);
Scott D. Luning, Poughkeepsie, NY (US);
Inventors:
William G. En, Milpitas, CA (US);
Thorsten Kammler, Ottendorf-Okrilla, DE;
Eric N. Paton, Morgan Hill, CA (US);
Scott D. Luning, Poughkeepsie, NY (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
Abstract
A sidewall spacer structure is formed adjacent to a gate structure whereby a material forming an outer surface of the sidewall spacer structure contains nitrogen. Subsequent to its formation the sidewall spacer structure is annealed to harden the sidewall spacer structure from a subsequent cleaning process. An epitaxial layer is formed subsequent to the cleaning process.