The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7397556 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 08, 2008

Filed:

Oct. 31, 2006
Applicants:

Oliver D. Patterson, Poughkeepsie, NY (US);

Maryjane Brodsky, Salt Point, NY (US);

Kourosh Nafisi, Wappingers Falls, NY (US);

Inventors:

Oliver D. Patterson, Poughkeepsie, NY (US);

Maryjane Brodsky, Salt Point, NY (US);

Kourosh Nafisi, Wappingers Falls, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01R 31/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method, apparatus, and computer program product for implementing inspection recipe services are provided. The apparatus includes a test structure including a semiconductor substrate and a number of arrays disposed on the semiconductor substrate. The arrays are linearly arranged and spaced equidistant. Each of the arrays corresponds to a reticle field and includes a number of cells. The test structure also includes a defect programmed into every third array. The defect is programmed in the same location on each third array. The test structure further includes an alignment site defined on the test structure for providing a point of reference upon inspection. The alignment site, in conjunction with a modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field, are used to perform a random mode inspection of selected arrays in the test structure.


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