The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
Dec. 05, 2006
Douglas B. Hershberger, Essex Junction, VT (US);
Alain Loiseau, Williston, VT (US);
Kirk D. Peterson, Jericho, VT (US);
Robert M. Rassel, Colchester, VT (US);
Douglas B. Hershberger, Essex Junction, VT (US);
Alain Loiseau, Williston, VT (US);
Kirk D. Peterson, Jericho, VT (US);
Robert M. Rassel, Colchester, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Methods of adjusting a resistance of a buried resistor in a semiconductor are disclosed. In one aspect, the method includes using a silicidation blocking mask to define the buried resistor in the semiconductor; adjusting a size of the silicidation blocking mask to adjust a resistance of the buried resistor based on test data from a previous processing lot including a substantially similar buried resistor; and forming silicide on an area not covered by the silicidation blocking mask. The adjustment may be made by balancing the amount of the resistor that is covered with silicide versus un-silicided semiconductor to achieve the desired total resistance. The adjustment may be made according to an algorithm.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile