The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
Jun. 20, 2007
Robert David Allen, San Jose, CA (US);
Gregory Breyta, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Richard A. Dipietro, Campbell, CA (US);
David R. Medeiros, Ossining, NY (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Robert David Allen, San Jose, CA (US);
Gregory Breyta, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Richard A. DiPietro, Campbell, CA (US);
David R. Medeiros, Ossining, NY (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.