The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
Sep. 29, 2004
Rajinder Dhindsa, San Jose, CA (US);
Felix Kozakevich, Sunnyvale, CA (US);
Eric Lenz, Pleasanton, CA (US);
Russell Martin, Livermore, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Felix Kozakevich, Sunnyvale, CA (US);
Eric Lenz, Pleasanton, CA (US);
Russell Martin, Livermore, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An arrangement in a plasma processing system for selectively providing an RF grounding path between an electrode and ground. The arrangement includes an RF conduction path structure and an annular structure. The annular structure and the RF conduction path structure having two relative positions relative to one another. A first relative position of the two relative positions is characterized by the annular structure electrically coupling with the RF conduction path structure to provide a ground to the RF conduction path structure. A second relative position of the two relative positions is characterized by the annular structure being electrically uncoupled from the RF conduction path.