The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2008
Filed:
Jan. 22, 2004
Hai Deng, Mountain View, CA (US);
Yueh Wang, Portland, OR (US);
Huey-chiang Liou, Fremont, CA (US);
Hok-kin Choi, San Jose, CA (US);
Robert M. Meagley, Hillsboro, CA (US);
Ernisse Putna, Beaverton, OR (US);
Hai Deng, Mountain View, CA (US);
Yueh Wang, Portland, OR (US);
Huey-Chiang Liou, Fremont, CA (US);
Hok-Kin Choi, San Jose, CA (US);
Robert M. Meagley, Hillsboro, CA (US);
Ernisse Putna, Beaverton, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Compositions for immersion liquid materials and associated immersion lithography systems and techniques. Examples of polymer or oligomer-based immersion liquids are described to exhibit superior material properties for immersion lithography in comparison with water and some other commonly-used immersion liquids. In addition, certain material additives may be added to water and water-based immersion liquids to improve the performance of the immersion liquids in immersion lithography.