The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2008

Filed:

Jul. 20, 2006
Applicants:

Chun-chieh Chang, Tainan County, TW;

Tzung-yu Hung, Tainan Hsien, TW;

Chao-ching Hsieh, Hsin-Chu Hsien, TW;

Yi-wei Chen, Tai-Chung Hsien, TW;

Yu-lan Chang, Kao-Hsiung, TW;

Inventors:

Chun-Chieh Chang, Tainan County, TW;

Tzung-Yu Hung, Tainan Hsien, TW;

Chao-Ching Hsieh, Hsin-Chu Hsien, TW;

Yi-Wei Chen, Tai-Chung Hsien, TW;

Yu-Lan Chang, Kao-Hsiung, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of stripping a remnant metal is disclosed. The remnant metal is formed on a transitional silicide of a silicon substrate. Firstly, a surface oxidation process is performed on the transitional silicide, so as to form a protective layer on the transitional silicide. Then, a HPM stripping process is performed on the silicon substrate in order to strip the remnant metal.


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