The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2008
Filed:
May. 26, 2004
Applicants:
Min LI, Dublin, CA (US);
Cheng T. Horng, San Jose, CA (US);
Cherng Chyi Han, San Jose, CA (US);
Yu-hsia Chen, San Jose, CA (US);
Ru-ying Tong, San Jose, CA (US);
Inventors:
Min Li, Dublin, CA (US);
Cheng T. Horng, San Jose, CA (US);
Cherng Chyi Han, San Jose, CA (US);
Yu-Hsia Chen, San Jose, CA (US);
Ru-Ying Tong, San Jose, CA (US);
Assignee:
Headway Technologies, Inc., Milpitas, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
By using a free layer that includes a NiFe layer containing between 65 and 72 atomic percent iron, an improved CPP GMR device has been created. The resulting structure yields a higher CPP GMR ratio than prior art devices, while maintaining free layer softness and acceptable magnetostriction. A process for manufacturing the device is also described.