The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2008
Filed:
Oct. 11, 2005
Martin Schriever, Aalen, DE;
Helmut Haidner, Aalen, DE;
Martin Schriever, Aalen, DE;
Helmut Haidner, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A wavefront source having a wavefront formation structure () and a diffuser with a scattering structure () in the beam path in front of or at the level of the wavefront formation structure; also a diffuser configured to be used therefor, and a wavefront sensor equipped therewith, as well as a corresponding projection exposure apparatus. The diffuser has a diffractive computer-generated hologram (CGH) scattering structure with a predetermined angular scattering profile. The wavefront source includes such a diffuser and/or a focusing element with a reflecting diffractive focusing structure () in the beam path at the level of the scattering structure or between the scattering structure () and the wavefront formation structure (). The disclosed structures are used, e.g., in the wavefront measurement of projection objectives in microlithography projection exposure apparatuses in the EUV wavelength range.