The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2008
Filed:
Aug. 24, 2005
Takashi Doi, Hitachinaka, JP;
Noriaki Arai, Hitachinaka, JP;
Hidetoshi Morokuma, Hitachinaka, JP;
Katsumi Setoguchi, Hitachinaka, JP;
Fumihiro Sasajima, Hitachinaka, JP;
Maki Tanaka, Yokohama, JP;
Atsushi Miyamoto, Yokohama, JP;
Takashi Doi, Hitachinaka, JP;
Noriaki Arai, Hitachinaka, JP;
Hidetoshi Morokuma, Hitachinaka, JP;
Katsumi Setoguchi, Hitachinaka, JP;
Fumihiro Sasajima, Hitachinaka, JP;
Maki Tanaka, Yokohama, JP;
Atsushi Miyamoto, Yokohama, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A charged particle beam adjustment apparatus for tilting an electron beam by a tilt deflector is disclosed. The tilt angle adjustment of the electron beam and the distortion adjustment for correcting the image distortion generated when the electron beam is tilted are conducted on a specified. sample such as a pyramidal sample. The images before and after the tilting are acquired and processed to determine the tilt angle value and the distortion amount. The tilt angle adjustment and the adjustment for correction of the distortion are automated in accordance with a predetermined processing flow.