The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2008
Filed:
Nov. 29, 2006
Yuri Granik, Palo Alto, CA (US);
Dmitry Medvedev, Santa Clara, CA (US);
Yuri Granik, Palo Alto, CA (US);
Dmitry Medvedev, Santa Clara, CA (US);
Mentor Graphics Corporation, Wilsonville, OR (US);
Abstract
A grid-based resist simulator predicts how a wafer coated with one or more resist layers will develop when exposed with a mask pattern. Image intensity values are calculated at a grid of points on the wafer, and the image intensity points are analyzed with a resist simulator that produces a resist surface function. A threshold contour of the resist surface function defines how the mask pattern will print on a wafer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile