The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2008
Filed:
Jul. 29, 2004
Lindsey H. Hall, Plano, TX (US);
Trace Q. Hurd, Plano, TX (US);
Deborah J. Riley, Richardson, TX (US);
Lindsey H. Hall, Plano, TX (US);
Trace Q. Hurd, Plano, TX (US);
Deborah J. Riley, Richardson, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present invention provides a process of manufacturing a semiconductor devicewhile reducing silicon loss. In one aspect, the process includes removing a photoresist layerfrom a semiconductor substrateadjacent a gateand cleaning the semiconductor substrate with a wet clean solution. The removing step includes subjecting the photoresist layerto a plasma ash. The plasma ash removes at least a portion of a crustformed on the photoresist layerbut leaves a substantial portion of the photoresist layer. The photoresist layeris subjected to a wet etch subsequent to the plasma ash that removes a substantial portion of the photoresist layer