The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2008
Filed:
Jan. 09, 2004
Takashi Miyamatsu, Tokyo, JP;
Hirokazu Niwata, Tokyo, JP;
Satoshi Ebata, Tokyo, JP;
Yong Wang, Tokyo, JP;
Takashi Miyamatsu, Tokyo, JP;
Hirokazu Niwata, Tokyo, JP;
Satoshi Ebata, Tokyo, JP;
Yong Wang, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein Rrepresents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —ORgroup, wherein Ris a monovalent alicyclic hydrocarbon group, Rrepresents a (substituted)-alkyl group or two or more Rgroups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and Xindicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.