The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2008
Filed:
Oct. 29, 2002
Guenther Czech, Langebrück, DE;
Carsten Fuelber, Dresden, DE;
Markus Kirchhoff, Ottendorf-Okrilla, DE;
Maik Stegemann, Dresden, DE;
Mirko Vogt, Dresden, DE;
Stephan Wege, Dresden, DE;
Guenther Czech, Langebrück, DE;
Carsten Fuelber, Dresden, DE;
Markus Kirchhoff, Ottendorf-Okrilla, DE;
Maik Stegemann, Dresden, DE;
Mirko Vogt, Dresden, DE;
Stephan Wege, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A carbon hard mask layer is applied to a substrate to be patterned by means of a plasma-enhanced deposition process in such a manner that it has a hardness comparable to that of diamond in at least one layer thickness section. During the production of this diamond-like layer thickness section, the parameters used in the deposition are set in such a manner that growth regions which are produced in a form other than diamond-like are removed again in situ by means of subsequent etching processes and that diamond-like regions which are formed are retained.