The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
Feb. 03, 2005
Scott D. Allen, Legewood, NJ (US);
Kenneth A. Bandy, Red Hook, NY (US);
Sadanand V. Deshpande, LeGrangeville, NY (US);
Richard Wise, New Windsor, NY (US);
Scott D. Allen, Legewood, NJ (US);
Kenneth A. Bandy, Red Hook, NY (US);
Sadanand V. Deshpande, LeGrangeville, NY (US);
Richard Wise, New Windsor, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The embodiments of the invention generally relate to an etching process, and more particularly to an etch processing for improving the yield of dielectric contacts on nickel silicides. An oxygen-free feedgas is used in an etching process to reduce or eliminate residuals, including oxidation and consumption of the silicide layer, at the contact surface. The contact resistance at contact surface is reduced, thereby improving the performance of the device.