The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2008
Filed:
Apr. 16, 2004
Applicants:
Johannes Mathias Theodorus Antonius Adriaens, Eindhoven, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Inventors:
Johannes Mathias Theodorus Antonius Adriaens, Eindhoven, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
In an interferometric displacement measuring system, a correction for beamshear is made. The correction may be a polynomial of a variable proportional to the length of the optical path traversed by the measurement beam and the angle of the measurement mirror. The correction compensates for errors caused by non-planarity of the wavefront of the measurement beam.