The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2008

Filed:

Aug. 30, 2002
Applicants:

Dennis J. Ciplickas, San Jose, CA (US);

Brian E. Stine, Santa Clara, CA (US);

Yanwen Fei, Fairfax, VA (US);

Inventors:

Dennis J. Ciplickas, San Jose, CA (US);

Brian E. Stine, Santa Clara, CA (US);

Yanwen Fei, Fairfax, VA (US);

Assignee:

PDF Solutions, Inc., San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/58 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
Abstract

A test structure comprising a test pattern is formed on a substrate. The test pattern includes a first comb structure having a plurality of tines, and a second structure. The second structure may be a snake structure having a plurality of side walls or a second comb structure having a plurality of side walls. The tines of the first comb structure are positioned within side walls of the snake structure or second comb structure. The tines of the first comb structure are offset from a center of the side walls. Test data collected from the test structure are analyzed, to estimate product yield. The test structure may have a lower layer pattern, such that topographical variations of the lower layer pattern propagate to an upper layer pattern of the test structure.


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