The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2008
Filed:
Feb. 25, 2005
Tsuyoshi Moriya, Nirasaki, JP;
Hiroshi Nagaike, Nirasaki, JP;
Hiroyuki Nakayama, Nirasaki, JP;
Kikuo Okuyama, Higashihiroshima, JP;
Manabu Shimada, Higashihiroshima, JP;
Tsuyoshi Moriya, Nirasaki, JP;
Hiroshi Nagaike, Nirasaki, JP;
Hiroyuki Nakayama, Nirasaki, JP;
Kikuo Okuyama, Higashihiroshima, JP;
Manabu Shimada, Higashihiroshima, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A processing apparatus includes a first detection unit for detecting a temperature of an inner wall of the vacuum vessel, a second detection unit for detecting a temperature of the processing unit, and a first control unit for controlling a temperature of the gas. The first control unit controls the temperature of the gas based on a temperature gradient between the temperatures of the inner wall and the gas or a temperature gradient between the temperatures of the processing unit and the gas. A method for removing particles from a processing apparatus includes a first detection step for detecting a temperature of an inner wall of the vacuum vessel, a second detection step for detecting a temperature of the processing unit, a first control step for controlling a temperature of the gas, and a gas introduction step for introducing the gas into the inner space of the vacuum vessel.