The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2008

Filed:

Mar. 23, 2004
Applicants:

Richard L. Sandstrom, Encinitas, CA (US);

John Martin Algots, San Diego, CA (US);

Joshua C. Brown, Escondido, CA (US);

Raymond F. Cybulski, San Diego, CA (US);

John Dunlop, San Diego, CA (US);

James K. Howey, Vista, CA (US);

Richard G. Morton, San Diego, CA (US);

Xiaojiang Pan, San Diego, CA (US);

William N. Partlo, Poway, CA (US);

Firas F. Putris, La Mesa, CA (US);

Tom A. Watson, Carlsbad, CA (US);

Thomas A. Yager, Encinitas, CA (US);

Inventors:

Richard L. Sandstrom, Encinitas, CA (US);

John Martin Algots, San Diego, CA (US);

Joshua C. Brown, Escondido, CA (US);

Raymond F. Cybulski, San Diego, CA (US);

John Dunlop, San Diego, CA (US);

James K. Howey, Vista, CA (US);

Richard G. Morton, San Diego, CA (US);

Xiaojiang Pan, San Diego, CA (US);

William N. Partlo, Poway, CA (US);

Firas F. Putris, La Mesa, CA (US);

Tom A. Watson, Carlsbad, CA (US);

Thomas A. Yager, Encinitas, CA (US);

Assignee:

Cymer, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 3/08 (2006.01); H01S 3/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.


Find Patent Forward Citations

Loading…