The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Mar. 05, 2004
Robert Frans Maria Hendriks, Eindhoven, NL;
Egbert Lenderink, Waalre, NL;
Rene Monshouwer, Eindhoven, NL;
Alexander Marc Van Der Lee, Eindhoven, NL;
Gert Wim 't Hooft, Eindhoven, NL;
Robert Frans Maria Hendriks, Eindhoven, NL;
Egbert Lenderink, Waalre, NL;
Rene Monshouwer, Eindhoven, NL;
Alexander Marc Van Der Lee, Eindhoven, NL;
Gert Wim 'T Hooft, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Abstract
A lithographic apparatus equipped with an improved alignment system, is presented herein. In one embodiment, the apparatus includes a radiation system for providing a projection beam of radiation, a support structure for supporting a patterning device that configures the projection beam according to a desired pattern, a substrate holder for holding a substrate, projection system for projecting the patterned beam onto a target portion of the substrate, and an alignment system. The alignment system includes a radiation source for illuminating at least one mark which is usable for alignment on a substrate and an imaging system for imaging light which has interacted with the at least one mark to generate alignment information.