The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Jun. 14, 2007
Tsuneyuki Okabe, Oshu, JP;
Shigeyuki Okura, Nirasaki, JP;
Hiroki Doi, Komaki, JP;
Minoru Ito, Komaki, JP;
Yoji Mori, Komaki, JP;
Yasunori Nishimura, Komaki, JP;
Tsuneyuki Okabe, Oshu, JP;
Shigeyuki Okura, Nirasaki, JP;
Hiroki Doi, Komaki, JP;
Minoru Ito, Komaki, JP;
Yoji Mori, Komaki, JP;
Yasunori Nishimura, Komaki, JP;
CKD Corporation, Komaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A liquid raw material supply unit for a vaporizer is adapted to supply a liquid raw material to the vaporizer that vaporizes the liquid raw material. The unit comprises: a manifold internally formed with a flow passage; and a plurality of fluid control valves mounted on the manifold, wherein the plurality of fluid control valves includes: a liquid raw material control valve for controlling supply of the liquid raw material to the flow passage; a cleaning solution control valve for controlling supply of a cleaning solution to the flow passage; a purge gas control valve for controlling supply of a purge gas to the flow passage; and a first introducing control valve connectable to the vaporizer for controlling supply of a fluid from the flow passage to the vaporizer, the purge gas control valve, the cleaning solution control valve, the liquid raw material control valve, and the first introducing control valve being mounted on the manifold in this order from an upstream side of the manifold, wherein the flow passage is connected to valve ports of the plurality of control valves respectively, the valve ports communicating with valve openings of the respective control valves, and the flow passage is configured to allow the purge gas supplied from the purge gas control valve to directly flow in the valve ports of the cleaning solution control valve and the liquid raw material control valve placed downstream from the purge gas control valve.