The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2008
Filed:
Dec. 14, 2005
Gary A. Brist, Yamhill, OR (US);
Gary B. Long, Aloha, OR (US);
William O. Alger, Portland, OR (US);
Carlos Mejia, Portland, OR (US);
Bryce Horine, Beaverton, OR (US);
Gary A. Brist, Yamhill, OR (US);
Gary B. Long, Aloha, OR (US);
William O. Alger, Portland, OR (US);
Carlos Mejia, Portland, OR (US);
Bryce Horine, Beaverton, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A method and apparatus for reducing timing skew between conductor traces. A dielectric medium made of a resin reinforced with a fabric is provided. The fabric includes a first plurality of yarns running parallel to a first axis and a second plurality of yarns running parallel to a second axis. The first plurality of yarns are separated by a first weave pitch and the second plurality of yarns separated by a second weave pitch. At least two conductor traces are formed on the dielectric medium. The conductor traces are positioned on the dielectric medium such that the conductor traces each have substantially similar effective dielectric constants.