The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 2008

Filed:

Mar. 04, 2006
Applicants:

Sung Mun Jung, Singapore, SG;

Ching Dong Wang, Singapore, SG;

Louis Yoke Leng Lim, Singapore, SG;

Swee Tuck Woo, Singapore, SG;

Donghua Liu, Singapore, SG;

Xiaoyu Chen, Singapore, SG;

Inventors:

Sung Mun Jung, Singapore, SG;

Ching Dong Wang, Singapore, SG;

Louis Yoke Leng Lim, Singapore, SG;

Swee Tuck Woo, Singapore, SG;

Donghua Liu, Singapore, SG;

Xiaoyu Chen, Singapore, SG;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/82 (2006.01);
U.S. Cl.
CPC ...
Abstract

An integrated circuit memory system including a substrate formed with equidistant spaced shallow trench isolation regions. Forming active regions and dummy active regions within the substrate between the equidistant spaced shallow trench isolation regions. Forming sources and drains within the active regions. Providing wordlines and source lines extending in a first direction and bitlines extending in a second direction. Forming contact regions over the dummy active regions for strapping the wordlines and the source lines to the bitlines.


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