The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2008
Filed:
May. 07, 2004
Applicants:
Yuji Yamaguchi, San Antonio, TX (US);
Pierre Leroux, San Antonio, TX (US);
Inventors:
Yuji Yamaguchi, San Antonio, TX (US);
Pierre Leroux, San Antonio, TX (US);
Assignee:
NXP B.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G01B 11/00 (2006.01); G01B 9/00 (2006.01); G06K 9/00 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention enables the user to measure process line shortening (PLS) on an overlay tool. In an example embodiment (), to obtain the PLS, the user applies a method to determine the misalignment (MA) of a composite image on a substrate (), from the composite image the user may determine the total line () shortening (TLS) and the equipment line () shortening (ELS). The process line shortening (PLS) is determined () as a function of TLS and ELS.