The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2008
Filed:
Jan. 09, 2006
Takehiko Orii, Nirasaki, JP;
Masaru Amai, Tokyo-To, JP;
Takehiko Orii, Nirasaki, JP;
Masaru Amai, Tokyo-To, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing apparatus and a substrate processing method are provided wherein an oxide film which is thinner than the conventional films can be formed with uniform thickness when forming an oxide film on the front-side surface of a substrate. A substrate processing apparatus () for processing a substrate (W) by feeding a processing liquid comprises: a temperature regulator () to regulate the temperature of said processing liquid; and a underplate temperature adjuster () to adjust the temperature of an underplate () which is placed in proximity to the backside surface of said substrate W.