The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2008
Filed:
Dec. 12, 2003
Pawan K. Nimmakayala, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung-jin Choi, Round Rock, TX (US);
Anshuman Cherala, Austin, TX (US);
Pawan K. Nimmakayala, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung-Jin Choi, Round Rock, TX (US);
Anshuman Cherala, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
The present invention is directed to a method of controlling dimensional relations between an original pattern present in a mold and a recorded pattern formed in a layer of a substrate. In this manner, the size of the recorded pattern may appear to be magnified and/or reduced, when compared to the original pattern. To that end, the method comprises defining a region on the layer in which to produce the recorded pattern. The substrate is bent to produce a contoured surface in the region. Dimensional variations in the original pattern are produced by bending the mold, defining a varied pattern. The contoured surface and the mold are provided to have similar radii of curvatures. The varied pattern is then recorded in the layer. These and other embodiments of the present invention are discussed more fully below.