The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2007

Filed:

Oct. 27, 2004
Applicants:

Kazunari Sekigawa, Nagano, JP;

Toshinori Koyama, Nagano, JP;

Kazutaka Kobayashi, Nagano, JP;

Masatoshi Akagawa, Nagano, JP;

Inventors:

Kazunari Sekigawa, Nagano, JP;

Toshinori Koyama, Nagano, JP;

Kazutaka Kobayashi, Nagano, JP;

Masatoshi Akagawa, Nagano, JP;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/46 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A direct exposure system comprises: a data mask that is a data object including drawing data; and a control mask that is a data object including at least one logical layer in which information about exposure conditions applied according to regions on a substrate is specified, and performs a direct exposure process using integrated data generated by combining the data mask with the control mask.


Find Patent Forward Citations

Loading…