The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2007

Filed:

Sep. 12, 2005
Applicants:

Wenpin LU, Hsinchu, TW;

Shaw Hung Ku, Taipei, TW;

Inventors:

Wenpin Lu, Hsinchu, TW;

Shaw Hung Ku, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C 11/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

Hole annealing methods are described after erasure of nitride storage memory cells for compensating trapped holes to minimize the holes from detrapping in order to reduce the amount of threshold voltage from drifting significantly higher. A soft hot electron program is used to selected nitride storage memory cells that have been detected to have a threshold voltage that is higher than a presetting threshold voltage (EV) minus a wordline delta X. The effect of the soft electron program neutralizes the excess holes introduced by erasure of nitride storage memory cells that decreases the amount of threshold voltage from drifting higher. In one embodiment, a hole annealing method describes a soft hot electron programming to nitride storage memory cells in a block of nitride memory array that have been determined to have a threshold voltage higher than the presetting threshold voltage minus the wordline delta X.


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