The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Dec. 14, 2004
Samuel V. Dunton, San Jose, CA (US);
Steven J. Radigan, Fremont, CA (US);
Samuel V. Dunton, San Jose, CA (US);
Steven J. Radigan, Fremont, CA (US);
Sandisk 3D LLC, Milpitas, CA (US);
Abstract
A method is provided to clean slurry particles from a surface in which tungsten and dielectric are coexposed after a dielectric CMP step. Such a surface is formed when tungsten features are patterned and etched, the tungsten features are covered with dielectric, and the dielectric is planarized to expose tops of the tungsten features. The surface to be cleaned is subjected to mechanical action in an acid environment. Suitable mechanical action includes performing a brief tungsten CMP step on the tungsten features or scrubbing the surface using, for example, a commercial post-CMP scrubber.