The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Mar. 29, 2006
Sterling G. Watson, Palo Alto, CA (US);
Ady Levy, Sunnyvale, CA (US);
Chris A. Mack, Austin, TX (US);
Stanley E. Stokowski, Danville, CA (US);
Zain K. Saidin, San Mateo, CA (US);
Sterling G. Watson, Palo Alto, CA (US);
Ady Levy, Sunnyvale, CA (US);
Chris A. Mack, Austin, TX (US);
Stanley E. Stokowski, Danville, CA (US);
Zain K. Saidin, San Mateo, CA (US);
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
Disclosed are techniques for determining and correcting reticle variations using a reticle global variation map generated by comparing a set of measured reticle parameters to a set of reference reticle parameters. The measured reticle parameters are obtained by reticle inspection, and the variation map identifies reticle regions and associated levels of correction. In one embodiment, the variation data is communicated to a system which modifies the reticle by embedding scattering centers within the reticle at identified reticle regions, thereby improving the variations. In another embodiment the variation data is transferred to a wafer stepper or scanner which in turn modifies the conditions under which the reticle is used to manufacture wafers, thereby compensating for the variations and producing wafers that are according to design.