The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2007
Filed:
Oct. 15, 2002
Akihisa Hongo, Tokyo, JP;
Naoki Matsuda, Tokyo, JP;
Xinming Wang, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
There is provided a plating apparatus which can keep a plating solution always in its optimal condition while minimizing the amount of plating solution used, and which can easily form a uniform plated film on the plating surface of a workpiece. The plating apparatus includes: a plating solution supply system () for constantly circulating a plating solution while heating the plating solution in a circulation tank () provided with a heating apparatus (), and supplying a predetermined amount of plating solution to a plating treatment section () when carrying out plating treatment; a plating solution recovery system () for recovering the plating solution after the plating treatment in the plating treatment section (), heating the plating solution and returning the heated plating solution to the circulation tank (); and a plating solution replenishment system () for replenishing the circulation tank () with a fresh plating solution or a plating solution component.