The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2007
Filed:
Oct. 18, 2002
Applicants:
Thomas Petasch, Aalen, DE;
Hartmut Muenker, Aalen, DE;
Bernhard Gellrich, Aalen, DE;
Inventors:
Assignee:
Carl Zeiss Smt Ag, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention concerns an optical element () with an optical axis (), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension (') in the direction of the optical axis (). A device () enables to induce a two-wave or multiple wave deformation in said optical element (). At least a system () mounted in the extension zone (′) is designed to apply a force in said extension (′).