The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2007
Filed:
Sep. 20, 2006
Applicants:
Cristian Wagner, Aalen, DE;
Michael Gerhard, Aalen, DE;
Gerald Richter, Abtsgmünd, DE;
Inventors:
Assignee:
Carl Zeiss SMT AG, Oberkochen, unknown;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/20 (2006.01); G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.
Wagner, Cristian. (2007). Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same (U.S. Patent No. 7294814). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7294814
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile