The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2007

Filed:

Jul. 14, 2004
Applicants:

Merritt Funk, Austin, TX (US);

Kevin Augustine Pinto, Austin, TX (US);

Asao Yamashita, Wappingers Falls, NY (US);

Wesley Natzle, New Paltz, NY (US);

Inventors:

Merritt Funk, Austin, TX (US);

Kevin Augustine Pinto, Austin, TX (US);

Asao Yamashita, Wappingers Falls, NY (US);

Wesley Natzle, New Paltz, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

A processing method of processing a substrate is presented that includes: receiving pre-process data, wherein the pre-process data comprises a desired process result and actual measured data for the substrate; determining a required process result, wherein the required process result comprises the difference between the desired process result and the actual measured data; creating a new process recipe by modifying a nominal recipe obtained from a processing tool using at least one of a static recipe and a formula model, wherein the new process recipe provides a new process result that is approximately equal to the required process result; and sending the new process recipe to the processing tool and the substrate.


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