The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2007

Filed:

Dec. 15, 2004
Applicants:

Albert Kreh, Solms, DE;

Henning Backhauss, Wetzlar, DE;

Detlef Michelsson, Wetzlar-Naunheim, DE;

Inventors:

Albert Kreh, Solms, DE;

Henning Backhauss, Wetzlar, DE;

Detlef Michelsson, Wetzlar-Naunheim, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Defects on a wafer () can be detected using bright-field and/or dark-field illumination. The radiation incident onto the wafer () has, in this context, a substantial influence on the reliability of the measurement results. To improve the reliability of the measurement results, the wafer () is illuminated with an illumination device (), adjustment of the illumination device (), in particular its brightness and frequency, being accomplished in consideration of read-out stored illumination setpoints. These illumination setpoints are determined by way of a previous reference measurement.


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