The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2007
Filed:
Jul. 23, 2004
Yasuhiko Nara, Hitachinaka, JP;
Masaaki Nojiri, Hitachinaka, JP;
Kouichi Hayakawa, Hitachinaka, JP;
Takashi Hiroi, Yokohama, JP;
Yasuhiko Nara, Hitachinaka, JP;
Masaaki Nojiri, Hitachinaka, JP;
Kouichi Hayakawa, Hitachinaka, JP;
Takashi Hiroi, Yokohama, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The disclosed subject matter is related to a circuit pattern inspection apparatus for detecting a gradual changing of defect expanding over a large area of the semiconductor wafer. In order to detect a gradual changing of a defect related condition expanding over a large area of the semiconductor wafer, comparison is made between dies on a wafer that are separated from each other by a distance of at least one die width. For example, when a value according to a difference between such dies exceeds a pre-determined value, an existence of the gradual changing can be confirmed.