The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Feb. 23, 2005
Robert David Allen, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Dario Gil, Pleasantville, NY (US);
William Dinan Hinsberg, Fremont, CA (US);
Carl Eric Larson, San Jose, CA (US);
Linda Karin Sundberg, Los Gatos, CA (US);
Gregory Michael Wallraff, Morgan Hill, CA (US);
Robert David Allen, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Dario Gil, Pleasantville, NY (US);
William Dinan Hinsberg, Fremont, CA (US);
Carl Eric Larson, San Jose, CA (US);
Linda Karin Sundberg, Los Gatos, CA (US);
Gregory Michael Wallraff, Morgan Hill, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.