The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2007
Filed:
Sep. 23, 2002
Yeong Ryeol Kim, Daejeon, KR;
Ji Jong Park, Daejeon, KR;
Jin Yong Kim, Daejeon, KR;
Joong Whan Lee, Daejeon, KR;
Yeong Ryeol Kim, Daejeon, KR;
Ji Jong Park, Daejeon, KR;
Jin Yong Kim, Daejeon, KR;
Joong Whan Lee, Daejeon, KR;
KMAC, Daejeon, KR;
Abstract
The present invention relates to a non-contact, non-destructive measuring apparatus that measures thickness profile and refractive index distribution of a single or multiple layers of thin films by means of the principle of reflectometry. According to the present invention, by employing more than one narrow band-pass optical filters and a two-dimensional array of CCD sensors, and by finding an optimal solution for the nonlinear functional relationship between the thickness of said thin film or thin films and the corresponding refractive indexes by using an iterative numerical computation method, said apparatus simultaneously measures local area-wise thickness profile and refractive index distribution among others of said a single layer or multiple layers of thin films on a substrate.