The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2007
Filed:
Dec. 02, 2004
Applicants:
Michael R. Sievers, Poughkeepsie, NY (US);
Siddhartha Panda, Beacon, NY (US);
Richard Wise, New Windsor, NY (US);
Inventors:
Michael R. Sievers, Poughkeepsie, NY (US);
Siddhartha Panda, Beacon, NY (US);
Richard Wise, New Windsor, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/227 (2006.01);
U.S. Cl.
CPC ...
Abstract
Photoelectron emissions are used to detect an endpoint of a thickness alteration of a topmost layer in a set of layers undergoing patterning. The set of layers are irradiated, which causes an emission of photoelectrons. Upon receipt of or absence of a photoelectron emission, patterning endpoint is detected.