The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2007

Filed:

Dec. 29, 2003
Applicants:

Johannes Catharinus Hubertus Mulkens, Maastricht, NL;

Paul Van Der Veen, Waalre, NL;

Roel DE Jonge, Veldhoven, NL;

Roland Pieter Stolk, Sprang-Capelle, NL;

Inventors:

Johannes Catharinus Hubertus Mulkens, Maastricht, NL;

Paul Van Der Veen, Waalre, NL;

Roel De Jonge, Veldhoven, NL;

Roland Pieter Stolk, Sprang-Capelle, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lithographic projection apparatus is provided with a sensor for detecting one of luminescence radiation, desorbed particles, or free charges produced by an interaction of the projection beam with a material at surface of a substrate. The luminescence radiation, desorbed particles, or free charges are indicative of the dose delivered to the substrate, and can be detected close to the substrate or at the substrate level to avoid errors due to transmission variations in the optical path from the radiation source to the substrate.


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