The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2007
Filed:
Sep. 24, 2004
Applicants:
Guoheng Zhao, Sunnyvale, CA (US);
Stanley Stokowski, Danville, CA (US);
Mehdi Vaez-iravani, Santa Clara, CA (US);
Inventors:
Guoheng Zhao, Sunnyvale, CA (US);
Stanley Stokowski, Danville, CA (US);
Mehdi Vaez-Iravani, Santa Clara, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
Abstract
A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.