The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2007
Filed:
Mar. 31, 2005
Levinus Pieter Bakker, Helmond, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Konstantin Nikolaevitch Koshelev, Troitsk, RU;
Bastiaan Matthias Mertens, RK's-Gravenhage, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Givi Georgievitch Zukavishvili, Troitsk, RU;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
Marc Hubertus Lorenz Van Der Velden, Eindhoven, NL;
Levinus Pieter Bakker, Helmond, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Konstantin Nikolaevitch Koshelev, Troitsk, RU;
Bastiaan Matthias Mertens, RK's-Gravenhage, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Givi Georgievitch Zukavishvili, Troitsk, RU;
Bastiaan Theodoor Wolschrijn, Abcoude, NL;
Marc Hubertus Lorenz Van Der Velden, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.