The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2007
Filed:
Feb. 17, 2003
Tetsuo Yoshida, Yamanashi, JP;
Yoshiaki Sasaki, Yamanashi, JP;
Hiroaki Saeki, Yamanashi, JP;
Yasushi Taniyama, Aichi, JP;
Hiroshi Takizawa, Aichi, JP;
Tetsuo Yoshida, Yamanashi, JP;
Yoshiaki Sasaki, Yamanashi, JP;
Hiroaki Saeki, Yamanashi, JP;
Yasushi Taniyama, Aichi, JP;
Hiroshi Takizawa, Aichi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In a port structureA in a semiconductor processing system, a doorA is disposed in a portA defined by upright walland. A tableopposed to the port is disposed outside the system. Defined on the table is a mount regionfor mounting an open type cassetteA for a process subject substrate W. A hoodis disposed rotatable relative to the table. The hood defines in its closed position a closed space surrounding the mount region and port, the space having a size to receive the cassette. First ventholesare formed in the upright walls and/or the door so as to introduce gas from within the system into the closed space in the hood. Second ventholesare formed in the table so as to discharge the gas can be discharged out of the closed space.