The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
Jun. 13, 2005
Hiroshi Kawaguchi, Ehime, JP;
Takanori Yagita, Ehime, JP;
Takashi Nishi, Ehime, JP;
Junichi Murakami, Ehime, JP;
Mitsukuni Tsukihara, Ehime, JP;
Mitsuaki Kabasawa, Ehime, JP;
Hiroshi Kawaguchi, Ehime, JP;
Takanori Yagita, Ehime, JP;
Takashi Nishi, Ehime, JP;
Junichi Murakami, Ehime, JP;
Mitsukuni Tsukihara, Ehime, JP;
Mitsuaki Kabasawa, Ehime, JP;
SEN Corporation, an SHI and Axcelis Company, Tokyo, JP;
Abstract
A beam space-charge compensation device is applied to an angular energy filter provided in an ion beam processing system that performs processing by irradiating onto a wafer with an ion beam. The beam space-charge compensation device comprises a plasma shower provided in a beam-guiding chamber of the angular energy filter. The plasma shower comprises an arc chamber having a filament for generating thermo-electrons for plasma. The arc chamber comprises an extraction hole for extracting the thermo-electrons. The plasma shower is arranged such that the extraction hole is located on lines of magnetic force, perpendicular to an ion beam advancing direction, of the magnetic field and that a center axis of the filament and a center axis of said extraction hole coincide with the lines of magnetic force, perpendicular to the ion beam advancing direction, of the magnetic field.